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Http://dbpedia.org/resource/Category:Semiconductor device fabrication
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http://dbpedia.org/resource/Category:Semiconductor_device_fabrication
http://dbpedia.org/ontology/wikiPageID 1274670
http://dbpedia.org/ontology/wikiPageRevisionID 952692364
http://dbpedia.org/property/wikiPageUsesTemplate http://dbpedia.org/resource/Template:Commons_category + , http://dbpedia.org/resource/Template:CatAutoTOC + , http://dbpedia.org/resource/Template:Cat_main +
http://www.w3.org/2004/02/skos/core#broader http://dbpedia.org/resource/Category:Semiconductor_devices + , http://dbpedia.org/resource/Category:MOSFETs + , http://dbpedia.org/resource/Category:Electronics_manufacturing + , http://dbpedia.org/resource/Category:Microtechnology + , http://dbpedia.org/resource/Category:Industrial_processes +
http://www.w3.org/2004/02/skos/core#prefLabel Semiconductor device fabrication
http://www.w3.org/ns/prov#wasDerivedFrom http://en.wikipedia.org/wiki/Category:Semiconductor_device_fabrication?oldid=952692364&ns=14 +
owl:sameAs http://dbpedia.org/resource/Category:Semiconductor_device_fabrication +
rdf:type http://www.w3.org/2004/02/skos/core#Concept +
rdfs:label Semiconductor device fabrication
hide properties that link here 
http://dbpedia.org/resource/Selective_area_epitaxy + , http://dbpedia.org/resource/Plasma-immersion_ion_implantation + , http://dbpedia.org/resource/Shallow_trench_isolation + , http://dbpedia.org/resource/SEMI + , http://dbpedia.org/resource/Ion_beam + , http://dbpedia.org/resource/Redistribution_layer + , http://dbpedia.org/resource/Integrated_circuit_packaging + , http://dbpedia.org/resource/Three-dimensional_integrated_circuit + , http://dbpedia.org/resource/MOSIS + , http://dbpedia.org/resource/Multi-project_wafer_service + , http://dbpedia.org/resource/Reactive-ion_etching + , http://dbpedia.org/resource/Chalcogenide_chemical_vapour_deposition + , http://dbpedia.org/resource/Surface_activated_bonding + , http://dbpedia.org/resource/PROLITH + , http://dbpedia.org/resource/Thermal_laser_epitaxy + , http://dbpedia.org/resource/Micropipe + , http://dbpedia.org/resource/Cleanroom + , http://dbpedia.org/resource/Silicon_on_sapphire + , http://dbpedia.org/resource/Specification_for_human_interface_for_semiconductor_manufacturing_equipment + , http://dbpedia.org/resource/Atomic_layer_etching + , http://dbpedia.org/resource/Chemical-mechanical_polishing + , http://dbpedia.org/resource/Gas_immersion_laser_doping + , http://dbpedia.org/resource/Passivation_%28chemistry%29 + , http://dbpedia.org/resource/Ohmic_contact + , http://dbpedia.org/resource/Microtechnology + , http://dbpedia.org/resource/Focused_ion_beam + , http://dbpedia.org/resource/Restrictive_design_rules + , http://dbpedia.org/resource/Strained_silicon_directly_on_insulator + , http://dbpedia.org/resource/Bruno_Murari + , http://dbpedia.org/resource/Modulation_doping + , http://dbpedia.org/resource/Wafer_%28electronics%29 + , http://dbpedia.org/resource/Semiconductor_industry + , http://dbpedia.org/resource/Chemical_vapor_deposition + , http://dbpedia.org/resource/Product_engineering + , http://dbpedia.org/resource/Laser_chemical_vapor_deposition + , http://dbpedia.org/resource/Borophosphosilicate_glass + , http://dbpedia.org/resource/SECS/GEM + , http://dbpedia.org/resource/Wafer-scale_integration + , http://dbpedia.org/resource/FOUP + , http://dbpedia.org/resource/Semiconductor_industry_in_China + , http://dbpedia.org/resource/Alfred_Y._Cho + , http://dbpedia.org/resource/Diffusion_barrier + , http://dbpedia.org/resource/Glossary_of_microelectronics_manufacturing_terms + , http://dbpedia.org/resource/Dicing_tape + , http://dbpedia.org/resource/Ultraviolet_thermal_processing + , http://dbpedia.org/resource/Zyron + , http://dbpedia.org/resource/Coordinatograph + , http://dbpedia.org/resource/Die_preparation + , http://dbpedia.org/resource/WaferCatalyst + , http://dbpedia.org/resource/Process_variation_%28semiconductor%29 + , http://dbpedia.org/resource/Ion_implantation + , http://dbpedia.org/resource/Doping_%28semiconductor%29 + , http://dbpedia.org/resource/Microfabrication + , http://dbpedia.org/resource/Pulsed_laser_deposition + , http://dbpedia.org/resource/Laser_trimming + , http://dbpedia.org/resource/Through-silicon_via + , http://dbpedia.org/resource/Deep_reactive-ion_etching + , http://dbpedia.org/resource/Dry_etching + , http://dbpedia.org/resource/Advanced_silicon_etching + , http://dbpedia.org/resource/Etching_%28microfabrication%29 + , http://dbpedia.org/resource/Beam_lead_technology + , http://dbpedia.org/resource/Plasma_cleaning + , http://dbpedia.org/resource/Virtual_metrology + , http://dbpedia.org/resource/Remote_plasma + , http://dbpedia.org/resource/Ion_layer_gas_reaction + , http://dbpedia.org/resource/Tetrakis%28dimethylamido%29titanium + , http://dbpedia.org/resource/Substrate_mapping + , http://dbpedia.org/resource/Wafering + , http://dbpedia.org/resource/Semiconductor_fabrication_plant + , http://dbpedia.org/resource/Fabless_manufacturing + , http://dbpedia.org/resource/Integrated_device_manufacturer + , http://dbpedia.org/resource/Foundry_model + , http://dbpedia.org/resource/Alexander_Coucoulas + , http://dbpedia.org/resource/Sputter_deposition + , http://dbpedia.org/resource/Capacitance%E2%80%93voltage_profiling + , http://dbpedia.org/resource/High-Speed_SECS_Message_Services + , http://dbpedia.org/resource/Gate_count + , http://dbpedia.org/resource/Overlay_control + , http://dbpedia.org/resource/Polycide + , http://dbpedia.org/resource/Surface_growth + , http://dbpedia.org/resource/Back_end_of_line + , http://dbpedia.org/resource/Front_end_of_line + , http://dbpedia.org/resource/Epitaxy + , http://dbpedia.org/resource/Low-energy_plasma-enhanced_chemical_vapor_deposition + , http://dbpedia.org/resource/Product_binning + , http://dbpedia.org/resource/Molecular_layer_deposition + , http://dbpedia.org/resource/Novolak + , http://dbpedia.org/resource/Phenol_formaldehyde_resin + , http://dbpedia.org/resource/Deal%E2%80%93Grove_model + , http://dbpedia.org/resource/Metalorganic_vapour-phase_epitaxy + , http://dbpedia.org/resource/Atomic_layer_deposition + , http://dbpedia.org/resource/Wire_bonding + , http://dbpedia.org/resource/Plasma_etching + , http://dbpedia.org/resource/Reliability_%28semiconductor%29 + , http://dbpedia.org/resource/Process_design_kit + , http://dbpedia.org/resource/RCA_clean + , http://dbpedia.org/resource/Health_hazards_in_semiconductor_manufacturing_occupations + , http://dbpedia.org/resource/Device_under_test + , http://dbpedia.org/resource/Wafer_bond_characterization + , http://dbpedia.org/resource/Furnace_anneal + , http://dbpedia.org/resource/Rapid_thermal_processing + , http://dbpedia.org/resource/Wafer_testing + , http://dbpedia.org/resource/Electron_beam-induced_current + , http://dbpedia.org/resource/Hydride_vapour_phase_epitaxy + , http://dbpedia.org/resource/SMIF_%28interface%29 + , http://dbpedia.org/resource/Probe_card + , http://dbpedia.org/resource/Silicon_on_insulator + , http://dbpedia.org/resource/Semiconductor_intellectual_property_core + , http://dbpedia.org/resource/Evaporation_%28deposition%29 + , http://dbpedia.org/resource/Planar_process + , http://dbpedia.org/resource/Close-space_sublimation + , http://dbpedia.org/resource/Package_on_a_package + , http://dbpedia.org/resource/List_of_semiconductor_fabrication_plants + , http://dbpedia.org/resource/Semiconductor_device_fabrication + , http://dbpedia.org/resource/Wedge_bonding + , http://dbpedia.org/resource/Bow_and_warp_of_semiconductor_wafers_and_substrates + , http://dbpedia.org/resource/Ion_beam_lithography + , http://dbpedia.org/resource/Physical_vapor_deposition + , http://dbpedia.org/resource/Spin_coating + , http://dbpedia.org/resource/Wafer_fabrication + , http://dbpedia.org/resource/Cross_section_%28electronics%29 + , http://dbpedia.org/resource/Plasma_etcher + , http://dbpedia.org/resource/Lift-off_%28microtechnology%29 + , http://dbpedia.org/resource/B-staging + , http://dbpedia.org/resource/Stress_migration + , http://dbpedia.org/resource/Smart_cut + , http://dbpedia.org/resource/Wafer_backgrinding + , http://dbpedia.org/resource/Dark_current_spectroscopy + , http://dbpedia.org/resource/Titanium_nitride + , http://dbpedia.org/resource/Plasma_ashing + , http://dbpedia.org/resource/Ultrapure_water + , http://dbpedia.org/resource/Ultra-high-purity_steam_for_oxidation_and_annealing + , http://dbpedia.org/resource/Salicide + , http://dbpedia.org/resource/Metal-induced_crystallization + , http://dbpedia.org/resource/IBM_airgap + , http://dbpedia.org/resource/Wafer_dicing + , http://dbpedia.org/resource/Plasma-enhanced_chemical_vapor_deposition + , http://dbpedia.org/resource/Non-contact_wafer_testing + , http://dbpedia.org/resource/Layer_%28electronics%29 + , http://dbpedia.org/resource/Thermosonic_bonding + , http://dbpedia.org/resource/Oramir + , http://dbpedia.org/resource/Random_dopant_fluctuation + , http://dbpedia.org/resource/Channel-stopper + , http://dbpedia.org/resource/Resist_%28semiconductor_fabrication%29 + , http://dbpedia.org/resource/Phosphosilicate_glass + , http://dbpedia.org/resource/Ball_bonding + , http://dbpedia.org/resource/Ion_beam_mixing + , http://dbpedia.org/resource/Semiconductor_industry_in_Taiwan + , http://dbpedia.org/resource/Ampleon + , http://dbpedia.org/resource/Electrostatic_spray-assisted_vapour_deposition + , http://dbpedia.org/resource/Epitaxial_wafer + , http://dbpedia.org/resource/Negative-bias_temperature_instability + , http://dbpedia.org/resource/Monolayer_doping + , http://dbpedia.org/resource/Klaiber%27s_law + , http://dbpedia.org/resource/Drive-level_capacitance_profiling + , http://dbpedia.org/resource/Vapour_phase_decomposition + , http://dbpedia.org/resource/Hardmask + , http://dbpedia.org/resource/Spreading_resistance_profiling + http://dbpedia.org/ontology/wikiPageWikiLink
http://dbpedia.org/resource/Selective_area_epitaxy + , http://dbpedia.org/resource/Plasma-immersion_ion_implantation + , http://dbpedia.org/resource/Shallow_trench_isolation + , http://dbpedia.org/resource/SEMI + , http://dbpedia.org/resource/Ion_beam + , http://dbpedia.org/resource/Redistribution_layer + , http://dbpedia.org/resource/Integrated_circuit_packaging + , http://dbpedia.org/resource/Three-dimensional_integrated_circuit + , http://dbpedia.org/resource/MOSIS + , http://dbpedia.org/resource/Multi-project_wafer_service + , http://dbpedia.org/resource/Reactive-ion_etching + , http://dbpedia.org/resource/Chalcogenide_chemical_vapour_deposition + , http://dbpedia.org/resource/Surface_activated_bonding + , http://dbpedia.org/resource/PROLITH + , http://dbpedia.org/resource/Thermal_laser_epitaxy + , http://dbpedia.org/resource/Micropipe + , http://dbpedia.org/resource/Cleanroom + , http://dbpedia.org/resource/Silicon_on_sapphire + , http://dbpedia.org/resource/Specification_for_human_interface_for_semiconductor_manufacturing_equipment + , http://dbpedia.org/resource/Atomic_layer_etching + , http://dbpedia.org/resource/Chemical-mechanical_polishing + , http://dbpedia.org/resource/Gas_immersion_laser_doping + , http://dbpedia.org/resource/Passivation_%28chemistry%29 + , http://dbpedia.org/resource/Ohmic_contact + , http://dbpedia.org/resource/Microtechnology + , http://dbpedia.org/resource/Focused_ion_beam + , http://dbpedia.org/resource/Restrictive_design_rules + , http://dbpedia.org/resource/Strained_silicon_directly_on_insulator + , http://dbpedia.org/resource/Bruno_Murari + , http://dbpedia.org/resource/Modulation_doping + , http://dbpedia.org/resource/Wafer_%28electronics%29 + , http://dbpedia.org/resource/Semiconductor_industry + , http://dbpedia.org/resource/Chemical_vapor_deposition + , http://dbpedia.org/resource/Product_engineering + , http://dbpedia.org/resource/Laser_chemical_vapor_deposition + , http://dbpedia.org/resource/Borophosphosilicate_glass + , http://dbpedia.org/resource/SECS/GEM + , http://dbpedia.org/resource/Wafer-scale_integration + , http://dbpedia.org/resource/FOUP + , http://dbpedia.org/resource/Semiconductor_industry_in_China + , http://dbpedia.org/resource/Alfred_Y._Cho + , http://dbpedia.org/resource/Diffusion_barrier + , http://dbpedia.org/resource/Glossary_of_microelectronics_manufacturing_terms + , http://dbpedia.org/resource/Dicing_tape + , http://dbpedia.org/resource/Ultraviolet_thermal_processing + , http://dbpedia.org/resource/Zyron + , http://dbpedia.org/resource/Coordinatograph + , http://dbpedia.org/resource/Die_preparation + , http://dbpedia.org/resource/WaferCatalyst + , http://dbpedia.org/resource/Process_variation_%28semiconductor%29 + , http://dbpedia.org/resource/Ion_implantation + , http://dbpedia.org/resource/Doping_%28semiconductor%29 + , http://dbpedia.org/resource/Microfabrication + , http://dbpedia.org/resource/Pulsed_laser_deposition + , http://dbpedia.org/resource/Laser_trimming + , http://dbpedia.org/resource/Through-silicon_via + , http://dbpedia.org/resource/Deep_reactive-ion_etching + , http://dbpedia.org/resource/Dry_etching + , http://dbpedia.org/resource/Advanced_silicon_etching + , http://dbpedia.org/resource/Etching_%28microfabrication%29 + , http://dbpedia.org/resource/Beam_lead_technology + , http://dbpedia.org/resource/Plasma_cleaning + , http://dbpedia.org/resource/Virtual_metrology + , http://dbpedia.org/resource/Remote_plasma + , http://dbpedia.org/resource/Ion_layer_gas_reaction + , http://dbpedia.org/resource/Tetrakis%28dimethylamido%29titanium + , http://dbpedia.org/resource/Substrate_mapping + , http://dbpedia.org/resource/Wafering + , http://dbpedia.org/resource/Semiconductor_fabrication_plant + , http://dbpedia.org/resource/Fabless_manufacturing + , http://dbpedia.org/resource/Integrated_device_manufacturer + , http://dbpedia.org/resource/Foundry_model + , http://dbpedia.org/resource/Alexander_Coucoulas + , http://dbpedia.org/resource/Sputter_deposition + , http://dbpedia.org/resource/Capacitance%E2%80%93voltage_profiling + , http://dbpedia.org/resource/High-Speed_SECS_Message_Services + , http://dbpedia.org/resource/Gate_count + , http://dbpedia.org/resource/Overlay_control + , http://dbpedia.org/resource/Polycide + , http://dbpedia.org/resource/Surface_growth + , http://dbpedia.org/resource/Back_end_of_line + , http://dbpedia.org/resource/Front_end_of_line + , http://dbpedia.org/resource/Epitaxy + , http://dbpedia.org/resource/Low-energy_plasma-enhanced_chemical_vapor_deposition + , http://dbpedia.org/resource/Product_binning + , http://dbpedia.org/resource/Molecular_layer_deposition + , http://dbpedia.org/resource/Novolak + , http://dbpedia.org/resource/Phenol_formaldehyde_resin + , http://dbpedia.org/resource/Deal%E2%80%93Grove_model + , http://dbpedia.org/resource/Metalorganic_vapour-phase_epitaxy + , http://dbpedia.org/resource/Atomic_layer_deposition + , http://dbpedia.org/resource/Wire_bonding + , http://dbpedia.org/resource/Plasma_etching + , http://dbpedia.org/resource/Reliability_%28semiconductor%29 + , http://dbpedia.org/resource/Process_design_kit + , http://dbpedia.org/resource/RCA_clean + , http://dbpedia.org/resource/Health_hazards_in_semiconductor_manufacturing_occupations + , http://dbpedia.org/resource/Device_under_test + , http://dbpedia.org/resource/Wafer_bond_characterization + , http://dbpedia.org/resource/Furnace_anneal + , http://dbpedia.org/resource/Rapid_thermal_processing + , http://dbpedia.org/resource/Wafer_testing + , http://dbpedia.org/resource/Electron_beam-induced_current + , http://dbpedia.org/resource/Hydride_vapour_phase_epitaxy + , http://dbpedia.org/resource/SMIF_%28interface%29 + , http://dbpedia.org/resource/Probe_card + , http://dbpedia.org/resource/Silicon_on_insulator + , http://dbpedia.org/resource/Semiconductor_intellectual_property_core + , http://dbpedia.org/resource/Evaporation_%28deposition%29 + , http://dbpedia.org/resource/Planar_process + , http://dbpedia.org/resource/Close-space_sublimation + , http://dbpedia.org/resource/Package_on_a_package + , http://dbpedia.org/resource/List_of_semiconductor_fabrication_plants + , http://dbpedia.org/resource/Semiconductor_device_fabrication + , http://dbpedia.org/resource/Wedge_bonding + , http://dbpedia.org/resource/Bow_and_warp_of_semiconductor_wafers_and_substrates + , http://dbpedia.org/resource/Ion_beam_lithography + , http://dbpedia.org/resource/Physical_vapor_deposition + , http://dbpedia.org/resource/Spin_coating + , http://dbpedia.org/resource/Wafer_fabrication + , http://dbpedia.org/resource/Cross_section_%28electronics%29 + , http://dbpedia.org/resource/Plasma_etcher + , http://dbpedia.org/resource/Lift-off_%28microtechnology%29 + , http://dbpedia.org/resource/B-staging + , http://dbpedia.org/resource/Stress_migration + , http://dbpedia.org/resource/Smart_cut + , http://dbpedia.org/resource/Wafer_backgrinding + , http://dbpedia.org/resource/Dark_current_spectroscopy + , http://dbpedia.org/resource/Titanium_nitride + , http://dbpedia.org/resource/Plasma_ashing + , http://dbpedia.org/resource/Ultrapure_water + , http://dbpedia.org/resource/Ultra-high-purity_steam_for_oxidation_and_annealing + , http://dbpedia.org/resource/Salicide + , http://dbpedia.org/resource/Metal-induced_crystallization + , http://dbpedia.org/resource/IBM_airgap + , http://dbpedia.org/resource/Wafer_dicing + , http://dbpedia.org/resource/Plasma-enhanced_chemical_vapor_deposition + , http://dbpedia.org/resource/Non-contact_wafer_testing + , http://dbpedia.org/resource/Layer_%28electronics%29 + , http://dbpedia.org/resource/Thermosonic_bonding + , http://dbpedia.org/resource/Oramir + , http://dbpedia.org/resource/Random_dopant_fluctuation + , http://dbpedia.org/resource/Channel-stopper + , http://dbpedia.org/resource/Resist_%28semiconductor_fabrication%29 + , http://dbpedia.org/resource/Phosphosilicate_glass + , http://dbpedia.org/resource/Ball_bonding + , http://dbpedia.org/resource/Ion_beam_mixing + , http://dbpedia.org/resource/Semiconductor_industry_in_Taiwan + , http://dbpedia.org/resource/Ampleon + , http://dbpedia.org/resource/Electrostatic_spray-assisted_vapour_deposition + , http://dbpedia.org/resource/Epitaxial_wafer + , http://dbpedia.org/resource/Negative-bias_temperature_instability + , http://dbpedia.org/resource/Monolayer_doping + , http://dbpedia.org/resource/Klaiber%27s_law + , http://dbpedia.org/resource/Drive-level_capacitance_profiling + , http://dbpedia.org/resource/Vapour_phase_decomposition + , http://dbpedia.org/resource/Hardmask + , http://dbpedia.org/resource/Spreading_resistance_profiling + http://purl.org/dc/terms/subject
http://dbpedia.org/resource/Category:Fabless_semiconductor_companies + , http://dbpedia.org/resource/Category:Equipment_semiconductor_companies + , http://dbpedia.org/resource/Category:Silicon_wafer_producers + , http://dbpedia.org/resource/Category:Chemical_vapor_deposition + , http://dbpedia.org/resource/Category:Semiconductor_companies + , http://dbpedia.org/resource/Category:Nanoelectronics + , http://dbpedia.org/resource/Category:Semiconductor_fabrication_equipment + , http://dbpedia.org/resource/Category:Etching_%28microfabrication%29 + , http://dbpedia.org/resource/Category:Foundry_semiconductor_companies + , http://dbpedia.org/resource/Category:Semiconductor_growth + , http://dbpedia.org/resource/Category:Lithography_%28microfabrication%29 + , http://dbpedia.org/resource/Category:Packaging_%28microfabrication%29 + , http://dbpedia.org/resource/Category:Semiconductor_fabrication_materials + http://www.w3.org/2004/02/skos/core#broader
http://dbpedia.org/resource/Category:Semiconductor_device_fabrication + owl:sameAs
 

 

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