| http://dbpedia.org/ontology/abstract
|
L'ultravide est un niveau de vide très pou … L'ultravide est un niveau de vide très poussé, caractérisé par des pressions généralement inférieures à 10−6 Pa ou 10−7 Pa (soit 10−9 mbar, ou environ 10−9 Torr). L'air dans une chambre à ultra-vide est donc des billions de fois plus rare que dans l'atmosphère terrestre, dont la pression est de l’ordre de 105 Pa. Les techniques d'ultravide sont très utilisées dans la recherche, en microscopie et spectroscopie. Le régime de vide supérieur à l'ultravide est nommé extrême-vide et constitue la limite basse des pressions du domaine de l'ultravide, à 10−10 Pa. Atteindre des pressions très basses nécessite des développements techniques nombreux : il faut non seulement des pompes capables de raréfier suffisamment l'air, mais aussi des enceintes et des matériaux capables de maintenir le niveau de vide et des capteurs suffisamment performants et précis pour détecter le niveau de vide atteint.s pour détecter le niveau de vide atteint.
, Ultra-high vacuum (UHV) is the vacuum regi … Ultra-high vacuum (UHV) is the vacuum regime characterised by pressures lower than about 100 nanopascals (1.0×10−7 Pa; 1.0×10−9 mbar; 7.5×10−10 Torr). UHV conditions are created by pumping the gas out of a UHV chamber. At these low pressures the mean free path of a gas molecule is greater than approximately 40 km, so the gas is in free molecular flow, and gas molecules will collide with the chamber walls many times before colliding with each other. Almost all molecular interactions therefore take place on various surfaces in the chamber. UHV conditions are integral to scientific research. Surface science experiments often require a chemically clean sample surface with the absence of any unwanted adsorbates. Surface analysis tools such as X-ray photoelectron spectroscopy and low energy ion scattering require UHV conditions for the transmission of electron or ion beams. For the same reason, beam pipes in particle accelerators such as the Large Hadron Collider are kept at UHV.the Large Hadron Collider are kept at UHV.
, L'ultrabuit (en anglès Ultra-high vacuum, … L'ultrabuit (en anglès Ultra-high vacuum, UHV) és el règim de buit caracteritzat per pressions inferiors a 10−7 pascals o 100 nanopascals (10−9 mil·libars, ~10−9 torr). Les condicions d'UHV es creen mitjançant el bombeig del gas d'una cambra UHV. A aquestes baixes pressions, el recorregut lliure mitjà d'una molècula de gas és d'uns 40 km, de manera que les molècules de gas xoquen amb les parets de la cambra moltes vegades abans de xocar entre elles. Gairebé totes les interaccions moleculars tenen lloc, per tant, en diverses superfícies de la cambra. Les condicions de UHV són integrals per a la investigació científica. Els experiments en ciències de la superfície sovint requereixen una superfície d'exemple química neta amb l'absència de qualsevol adsorbat no desitjat. Les eines d'anàlisi de superfícies, com l'espectroscòpia de fotoelectrons de raigs X i la dispersió d'ions de baixa energia, requereixen condicions de UHV per a la transmissió d'electrons o bigues de ions. Per la mateixa raó, les canonades de feix en acceleradors de partícules com el Large Hadron Collider es mantenen en UHV. Large Hadron Collider es mantenen en UHV.
, Ultra-alto vácuo (em inglês: ultra-high va … Ultra-alto vácuo (em inglês: ultra-high vacuum) é um estrato do vácuo caracterizado por pressões menores do que 10−7 pascal ou 100 nanopascals (10−9 mbar, ~10−9 torr). O ultra-alto vácuo, UHV (do inglês: Ultra-high vacuum), necessita do uso de materiais raros para a construção do equipamento e do esquentamento do sistema para remover a água e restos de gases que se depositam nas superfícies da câmara. A pressões tão baixas, o percurso livre, médio, de uma molécula de gás é de aproximadamente 40 km, o que faz com que as moléculas choquem muitas vezes com as paredes da câmara antes de chocarem entre elas. Por isto, a maior parte dos choques das moléculas são com as superfícies da câmara.oléculas são com as superfícies da câmara.
, نظام فراغ فائق هو نظام من الفراغ يتميز بأن … نظام فراغ فائق هو نظام من الفراغ يتميز بأن قيم الضغط فيه منخفضة جداً، وتقع في حدود 100 نانوباسكال. تستخدم مضخات التفريغ من أجل الوصول إلى هذه الضغوط في العادة. ضمن هذه الشروط يكون لقيمة المسار الحر الوسطي لجزيء الغاز قيمة أكبر من حوالي 40 كم. يطبق هذا النظام فائق التفريغ في الأجهزة العلمية مثل مطيافية الكتلة على سبيل المثال؛ وكذلك أيضاً في مسرعات الجسيمات.يل المثال؛ وكذلك أيضاً في مسرعات الجسيمات.
, L'ultra alto vuoto (in inglese: ultra-high … L'ultra alto vuoto (in inglese: ultra-high vacuum da cui l'acronimo UHV) è caratterizzato da una pressione più bassa di 10−7 pascal o 100 nanopascal (10−9 mbar, 7.5x10−10 torr).A questi livelli di pressione il cammino libero medio delle molecole del gas è maggiore di 40 km, per cui in genere la collisione con la parete della camera da vuoto è il fenomeno dominante;quindi quasi tutte le interazioni molecolari avvengono sulle superfici della camera. Condizioni di UHV sono necessarie per alcune ricerche in campo scientifico, come gli esperimenti di scienza delle superfici che spesso richiedono delle superfici dei campioni pulite da un punto di vista chimico cioè prive di adsorbati. Alcune strumentazioni di analisi delle superfici come la spettroscopia fotoelettronica a raggi X o lo scattering di ioni di bassa energia necessitano di tale tipo di vuoto. Gli acceleratori di particelle come ad esempio LHC hanno la tubazione di molti chilometri in un vuoto di questo tipo, ma anche tali condizioni di vuoto sono necessarie negli interferometri usati per la rivelazione di onde gravitazionali.per la rivelazione di onde gravitazionali.
|
| http://dbpedia.org/ontology/wikiPageExternalLink
|
http://philiphofmann.net/surflec/node7.html +
|
| http://dbpedia.org/ontology/wikiPageID
|
1103359
|
| http://dbpedia.org/ontology/wikiPageLength
|
22301
|
| http://dbpedia.org/ontology/wikiPageRevisionID
|
1123919234
|
| http://dbpedia.org/ontology/wikiPageWikiLink
|
http://dbpedia.org/resource/Category:Vacuum +
, http://dbpedia.org/resource/Welding +
, http://dbpedia.org/resource/Electron_beam_welding +
, http://dbpedia.org/resource/Category:Vacuum_systems +
, http://dbpedia.org/resource/Vapour_pressure +
, http://dbpedia.org/resource/Secondary_ion_mass_spectrometry +
, http://dbpedia.org/resource/Pneumatics +
, http://dbpedia.org/resource/Silicon +
, http://dbpedia.org/resource/Roughing_pump +
, http://dbpedia.org/resource/Submerged_arc_welding +
, http://dbpedia.org/resource/Atom_Probe +
, http://dbpedia.org/resource/Outgassing +
, http://dbpedia.org/resource/Solder +
, http://dbpedia.org/resource/Atomic_force_microscopy +
, http://dbpedia.org/resource/Palladium +
, http://dbpedia.org/resource/Gas_metal_arc_welding +
, http://dbpedia.org/resource/Stepping_motor +
, http://dbpedia.org/resource/Shielded_metal_arc_welding +
, http://dbpedia.org/resource/Vacuum_system +
, http://dbpedia.org/resource/Glue +
, http://dbpedia.org/resource/Bake-out +
, http://dbpedia.org/resource/SAE_316L_stainless_steel +
, http://dbpedia.org/resource/Kinetic_theory_of_gases +
, http://dbpedia.org/resource/Titanium_sublimation_pump +
, http://dbpedia.org/resource/Surface_reconstruction +
, http://dbpedia.org/resource/Cadmium +
, http://dbpedia.org/resource/Atomic_physics +
, http://dbpedia.org/resource/Austenitic_stainless_steel +
, http://dbpedia.org/resource/Gate_valve +
, http://dbpedia.org/resource/Ceramic_materials +
, http://dbpedia.org/resource/Chlorinated_hydrocarbons +
, http://dbpedia.org/resource/304L +
, http://dbpedia.org/resource/Electropolishing +
, http://dbpedia.org/resource/316L +
, http://dbpedia.org/resource/Carbon_monoxide +
, http://dbpedia.org/resource/Non-Evaporable_Getter +
, http://dbpedia.org/resource/Magnetic_Permeability +
, http://dbpedia.org/resource/Virtual_leak +
, http://dbpedia.org/resource/Indium +
, http://dbpedia.org/resource/Carbon_steel +
, http://dbpedia.org/resource/Vacuum_engineering +
, http://dbpedia.org/resource/Flux-cored_arc_welding +
, http://dbpedia.org/resource/Scanning_tunneling_microscopy +
, http://dbpedia.org/resource/Zinc +
, http://dbpedia.org/resource/Stainless_steel +
, http://dbpedia.org/resource/TAMA_300 +
, http://dbpedia.org/resource/Chromium_carbide +
, http://dbpedia.org/resource/Orders_of_magnitude_%28pressure%29 +
, http://dbpedia.org/resource/Polytetrafluoroethylene +
, http://dbpedia.org/resource/Plastics +
, http://dbpedia.org/resource/LIGO +
, http://dbpedia.org/resource/Helium_mass_spectrometer +
, http://dbpedia.org/resource/Airlock +
, http://dbpedia.org/resource/Grain_boundaries +
, http://dbpedia.org/resource/Desorption +
, http://dbpedia.org/resource/Large_Hadron_Collider +
, http://dbpedia.org/resource/Virgo_interferometer +
, http://dbpedia.org/resource/Gas_tungsten_arc_welding +
, http://dbpedia.org/resource/Gravitational_waves +
, http://dbpedia.org/resource/Magnetic_bearing +
, http://dbpedia.org/resource/Vacuum_gauge +
, http://dbpedia.org/resource/Angle_resolved_photoemission_spectroscopy +
, http://dbpedia.org/resource/Electron_beam_evaporation +
, http://dbpedia.org/resource/Diffusion_pump +
, http://dbpedia.org/resource/Free_molecular_flow +
, http://dbpedia.org/resource/Liquid_nitrogen +
, http://dbpedia.org/resource/Tracer-gas_leak_testing +
, http://dbpedia.org/resource/X-ray_photoelectron_spectroscopy +
, http://dbpedia.org/resource/Organic_solvents +
, http://dbpedia.org/resource/Journal_of_Vacuum_Science_and_Technology +
, http://dbpedia.org/resource/Vacuum_state +
, http://dbpedia.org/resource/Steels +
, http://dbpedia.org/resource/Slag +
, http://dbpedia.org/resource/Surface_science +
, http://dbpedia.org/resource/Turbomolecular_pump +
, http://dbpedia.org/resource/Laser_beam_welding +
, http://dbpedia.org/resource/Electron-beam_lithography +
, http://dbpedia.org/resource/Field_emission_microscopy +
, http://dbpedia.org/resource/Sorption +
, http://dbpedia.org/resource/Molybdenum +
, http://dbpedia.org/resource/Chemical_vapor_deposition +
, http://dbpedia.org/resource/Vacuum +
, http://dbpedia.org/resource/Mean_free_path +
, http://dbpedia.org/resource/Thin_film +
, http://dbpedia.org/resource/Low_energy_ion_scattering +
, http://dbpedia.org/resource/Viton +
, http://dbpedia.org/resource/Semiconductor +
, http://dbpedia.org/resource/Particle_accelerator +
, http://dbpedia.org/resource/Adsorption +
, http://dbpedia.org/resource/Niobium +
, http://dbpedia.org/resource/Lead +
, http://dbpedia.org/resource/Q_factor +
, http://dbpedia.org/resource/Ion_gauge +
, http://dbpedia.org/resource/Gravitational_wave_detector +
, http://dbpedia.org/resource/Bose%E2%80%93Einstein_condensate +
, http://dbpedia.org/resource/Pressure +
, http://dbpedia.org/resource/Cryopump +
, http://dbpedia.org/resource/Thermal_desorption_spectroscopy +
, http://dbpedia.org/resource/Auger_electron_spectroscopy +
, http://dbpedia.org/resource/Field_ion_microscopy +
, http://dbpedia.org/resource/Screws +
, http://dbpedia.org/resource/Ion_pump +
, http://dbpedia.org/resource/Kalrez +
, http://dbpedia.org/resource/Adsorbed +
, http://dbpedia.org/resource/Molecular_beam_epitaxy +
, http://dbpedia.org/resource/Organic_compounds +
, http://dbpedia.org/resource/Sputtering +
, http://dbpedia.org/resource/Passivation_%28chemistry%29 +
, http://dbpedia.org/resource/GEO_600 +
, http://dbpedia.org/resource/Piezoelectric_motor +
, http://dbpedia.org/resource/SAE_304_stainless_steel +
, http://dbpedia.org/resource/Hydrogen +
, http://dbpedia.org/resource/Atomic_layer_deposition +
, http://dbpedia.org/resource/Ceramic +
, http://dbpedia.org/resource/Polyether_ether_ketone +
, http://dbpedia.org/resource/Pulsed_laser_deposition +
, http://dbpedia.org/resource/Vacuum_pump +
, http://dbpedia.org/resource/Cryogenic +
, http://dbpedia.org/resource/Ion_trap +
|
| http://dbpedia.org/property/wikiPageUsesTemplate
|
http://dbpedia.org/resource/Template:See_also +
, http://dbpedia.org/resource/Template:Use_American_English +
, http://dbpedia.org/resource/Template:Short_description +
, http://dbpedia.org/resource/Template:Main +
, http://dbpedia.org/resource/Template:Convert +
, http://dbpedia.org/resource/Template:Prose +
, http://dbpedia.org/resource/Template:Authority_control +
, http://dbpedia.org/resource/Template:Cn +
, http://dbpedia.org/resource/Template:Reflist +
|
| http://purl.org/dc/terms/subject
|
http://dbpedia.org/resource/Category:Vacuum_systems +
, http://dbpedia.org/resource/Category:Vacuum +
|
| http://purl.org/linguistics/gold/hypernym
|
http://dbpedia.org/resource/Regime +
|
| http://www.w3.org/ns/prov#wasDerivedFrom
|
http://en.wikipedia.org/wiki/Ultra-high_vacuum?oldid=1123919234&ns=0 +
|
| http://xmlns.com/foaf/0.1/isPrimaryTopicOf
|
http://en.wikipedia.org/wiki/Ultra-high_vacuum +
|
| owl:sameAs |
http://pt.dbpedia.org/resource/Ultra-alto_v%C3%A1cuo +
, http://fa.dbpedia.org/resource/%D8%AE%D9%84%D8%A7%D8%A1_%D9%81%D9%88%D9%82-%D8%A8%D8%A7%D9%84%D8%A7 +
, http://dbpedia.org/resource/Ultra-high_vacuum +
, http://ca.dbpedia.org/resource/Ultrabuit +
, http://it.dbpedia.org/resource/Ultra_alto_vuoto +
, http://www.wikidata.org/entity/Q7880334 +
, http://da.dbpedia.org/resource/Ultrah%C3%B8jt_vakuum +
, http://ar.dbpedia.org/resource/%D9%86%D8%B8%D8%A7%D9%85_%D9%81%D8%B1%D8%A7%D8%BA_%D9%81%D8%A7%D8%A6%D9%82 +
, http://rdf.freebase.com/ns/m.0466z2 +
, http://fr.dbpedia.org/resource/Ultravide +
, https://global.dbpedia.org/id/4w9dM +
, http://he.dbpedia.org/resource/%D7%95%D7%90%D7%A7%D7%95%D7%9D_%D7%90%D7%95%D7%9C%D7%98%D7%A8%D7%94-%D7%92%D7%91%D7%95%D7%94 +
, http://yago-knowledge.org/resource/Ultra-high_vacuum +
|
| rdf:type |
http://dbpedia.org/class/yago/WikicatVacuumSystems +
, http://dbpedia.org/class/yago/Artifact100021939 +
, http://dbpedia.org/class/yago/PhysicalEntity100001930 +
, http://dbpedia.org/ontology/Country +
, http://dbpedia.org/class/yago/Object100002684 +
, http://dbpedia.org/class/yago/Whole100003553 +
, http://dbpedia.org/class/yago/System104377057 +
, http://dbpedia.org/class/yago/Instrumentality103575240 +
|
| rdfs:comment |
L'ultra alto vuoto (in inglese: ultra-high … L'ultra alto vuoto (in inglese: ultra-high vacuum da cui l'acronimo UHV) è caratterizzato da una pressione più bassa di 10−7 pascal o 100 nanopascal (10−9 mbar, 7.5x10−10 torr).A questi livelli di pressione il cammino libero medio delle molecole del gas è maggiore di 40 km, per cui in genere la collisione con la parete della camera da vuoto è il fenomeno dominante;quindi quasi tutte le interazioni molecolari avvengono sulle superfici della camera.ri avvengono sulle superfici della camera.
, L'ultrabuit (en anglès Ultra-high vacuum, … L'ultrabuit (en anglès Ultra-high vacuum, UHV) és el règim de buit caracteritzat per pressions inferiors a 10−7 pascals o 100 nanopascals (10−9 mil·libars, ~10−9 torr). Les condicions d'UHV es creen mitjançant el bombeig del gas d'una cambra UHV. A aquestes baixes pressions, el recorregut lliure mitjà d'una molècula de gas és d'uns 40 km, de manera que les molècules de gas xoquen amb les parets de la cambra moltes vegades abans de xocar entre elles. Gairebé totes les interaccions moleculars tenen lloc, per tant, en diverses superfícies de la cambra.ant, en diverses superfícies de la cambra.
, نظام فراغ فائق هو نظام من الفراغ يتميز بأن … نظام فراغ فائق هو نظام من الفراغ يتميز بأن قيم الضغط فيه منخفضة جداً، وتقع في حدود 100 نانوباسكال. تستخدم مضخات التفريغ من أجل الوصول إلى هذه الضغوط في العادة. ضمن هذه الشروط يكون لقيمة المسار الحر الوسطي لجزيء الغاز قيمة أكبر من حوالي 40 كم. يطبق هذا النظام فائق التفريغ في الأجهزة العلمية مثل مطيافية الكتلة على سبيل المثال؛ وكذلك أيضاً في مسرعات الجسيمات.يل المثال؛ وكذلك أيضاً في مسرعات الجسيمات.
, Ultra-high vacuum (UHV) is the vacuum regi … Ultra-high vacuum (UHV) is the vacuum regime characterised by pressures lower than about 100 nanopascals (1.0×10−7 Pa; 1.0×10−9 mbar; 7.5×10−10 Torr). UHV conditions are created by pumping the gas out of a UHV chamber. At these low pressures the mean free path of a gas molecule is greater than approximately 40 km, so the gas is in free molecular flow, and gas molecules will collide with the chamber walls many times before colliding with each other. Almost all molecular interactions therefore take place on various surfaces in the chamber. place on various surfaces in the chamber.
, L'ultravide est un niveau de vide très pou … L'ultravide est un niveau de vide très poussé, caractérisé par des pressions généralement inférieures à 10−6 Pa ou 10−7 Pa (soit 10−9 mbar, ou environ 10−9 Torr). L'air dans une chambre à ultra-vide est donc des billions de fois plus rare que dans l'atmosphère terrestre, dont la pression est de l’ordre de 105 Pa. Les techniques d'ultravide sont très utilisées dans la recherche, en microscopie et spectroscopie. Le régime de vide supérieur à l'ultravide est nommé extrême-vide et constitue la limite basse des pressions du domaine de l'ultravide, à 10−10 Pa.ons du domaine de l'ultravide, à 10−10 Pa.
, Ultra-alto vácuo (em inglês: ultra-high va … Ultra-alto vácuo (em inglês: ultra-high vacuum) é um estrato do vácuo caracterizado por pressões menores do que 10−7 pascal ou 100 nanopascals (10−9 mbar, ~10−9 torr). O ultra-alto vácuo, UHV (do inglês: Ultra-high vacuum), necessita do uso de materiais raros para a construção do equipamento e do esquentamento do sistema para remover a água e restos de gases que se depositam nas superfícies da câmara. A pressões tão baixas, o percurso livre, médio, de uma molécula de gás é de aproximadamente 40 km, o que faz com que as moléculas choquem muitas vezes com as paredes da câmara antes de chocarem entre elas. Por isto, a maior parte dos choques das moléculas são com as superfícies da câmara.oléculas são com as superfícies da câmara.
|
| rdfs:label |
Ultrabuit
, نظام فراغ فائق
, Ultra alto vuoto
, Ultra-high vacuum
, Ultravide
, Ultra-alto vácuo
|
| rdfs:seeAlso |
http://dbpedia.org/resource/Vacuum_flange +
, http://dbpedia.org/resource/Airlock +
|
