| http://schema.org/description
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Verfahren zur Scheibenreinigung in der Mikroelektronik
, standard set of wafer cleaning steps which need to be performed before high-temperature processing steps of silicon wafers in semiconductor manufacturing
, és un conjunt estàndard de passos de neteja d'oblies.
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| http://schema.org/name
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RCA-reiniging
, RCA-Reinigung
, RCA clean
, RCA洗浄
, ஆர்சிஏ சுத்திகரிப்பு
, আরসিএ পরিষ্কারকরণ
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| http://www.w3.org/2004/02/skos/core#altLabel
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modifizierte Huang-Reinigung
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| http://www.w3.org/2004/02/skos/core#prefLabel
|
RCA-reiniging
, RCA-Reinigung
, RCA clean
, RCA洗浄
, ஆர்சிஏ சுத்திகரிப்பு
, আরসিএ পরিষ্কারকরণ
|
| http://www.wikidata.org/prop/P279
|
http://www.wikidata.org/entity/statement/Q1903370-c0a3ef7b-4676-c2fe-16a9-51a5815be106 +
|
| http://www.wikidata.org/prop/P6366
|
http://www.wikidata.org/entity/statement/Q1903370-612792DA-4501-4EFE-9294-6DA01583D358 +
|
| http://www.wikidata.org/prop/P646
|
http://www.wikidata.org/entity/statement/Q1903370-55B67444-FEA9-461D-8813-CE426D053436 +
|
| http://www.wikidata.org/prop/direct-normalized/P6366
|
https://makg.org/entity/47752232 +
|
| http://www.wikidata.org/prop/direct/P279
|
http://www.wikidata.org/entity/Q12773274 +
|
| http://www.wikidata.org/prop/direct/P6366
|
47752232
|
| http://www.wikidata.org/prop/direct/P646
|
/m/0h5mxq
|
| rdf:type |
http://wikiba.se/ontology#Item +
|
| rdfs:label |
RCA-reiniging
, RCA-Reinigung
, RCA clean
, RCA洗浄
, ஆர்சிஏ சுத்திகரிப்பு
, আরসিএ পরিষ্কারকরণ
|
